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Chip Fabrication

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In the chip manufacturing industry, ultrapure water is known as the "blood" of the industry. It is used throughout all core chip manufacturing processes, including silicon wafer cleaning, photoresist coating and development, wet etching, and chemical mechanical polishing (CMP).

These processes place extremely stringent demands on water quality; even the slightest impurity can cause chip fluid failure.

Among many water quality parameters, total organic carbon (TOC) is a key indicator of the degree of organic contamination in ultrapure water. The presence of TOC, even at extremely low levels of ppb (parts per billion) or even ppt (parts per trillion), can seriously impact the quality of delicate semiconductor devices.

Vacuum ultraviolet (VUV) technology, an advanced, chemical-free method for TOC degradation, uses high-energy ultraviolet light directly on water or organic matter in it, generating strong oxidizing free radicals that break down the organic matter into harmless small molecules.

Low-pressure mercury lamps are the primary VUV light source used in current industrial applications, with 185nm VUV light being the primary contributor to TOC degradation.

VUV light (185nm) can directly photolyze water molecules, generating hydroxyl radicals (·OH) in situ. ·OH is a highly reactive species with strong oxidizing power, capable of non-selectively oxidizing and degrading most organic pollutants in water. This process, when used in pure VUV photolysis, eliminates the need for additional chemical reagents, thus avoiding the risk of secondary contamination. This is particularly important for the preparation of ultrapure water.

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The target for controlling TOC in ultrapure water is typically less than 1 ppb (ug/L).

Advanced processes even require limits below 0.5 ppb or even ppt (ng/L).

· Position in the UPW system:

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Typical ultrapure water process flow chart

Advanced Treatment of Small-Molecular Organic Compounds

The UV/H?O? Advanced Oxidation Process (UV/H?O? AOP) is a highly efficient, non-selective advanced treatment technology for the removal of residual small-molecule organic compounds from reverse osmosis (RO) effluent.

?OH Radical Non-Selective Attack

The core of the UV/H?O? process is that under 185 nm or 254 nm UV light, H?O? undergoes homolytic cleavage to produce hydroxyl radicals (?OH). These radicals react with the C–H, C=C, and C≡C bonds of small-molecule organic compounds, continuously oxidizing small-molecule organic compounds (<350 Da, such as methanol, urea, oxalic acid, PPCPs, and EDCs) that are not retained by RO, ultimately mineralizing them into CO? and H?O.

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EX-UPW-TOC UV TOC System

The EX-UPW-TOC product series is an advanced and reliable system for total organic carbon (TOC) degradation in ultrapure water (UPW) production. Through enhanced 185nm transmittance, real-time UV intensity monitoring, and local/remote intelligent control, it achieves efficient, safe, and controllable TOC degradation. This equipment can reduce TOC levels in ultrapure water to below 1 ppb during the UPW production process.

MOS Ceramic Plate CD Ozone Generator

MOS-W water-cooled ozone generator adopts microfluidic water cooling technology and digital power control technology. Adaptive frequency control technology enables the ozone discharge chamber to work at the best efficiency, ensuring the output concentration and output of ozone.

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The treated water does not affect taste or flavor. It complies with water standards such as the Food Safety Law of the People's Republic of China, the Sanitary Standard for Drinking Water (GB 5749), the Drinking Water Quality Standard (CJ94-2005), the National Food Safety Standard for Drinking Natural Mineral Water (GB 8537-2018), and the Packaged Drinking Water Standard (DGB19298-2014).

UV Photolysis

UV photolysis generally refers to the use of ultraviolet (UV) light to decompose substances, particularly pollutants.

Specific wavelengths of UV light (usually short-wavelength UV-C, such as 254 nm) can directly break the molecular bonds of certain substances (especially organic pollutants), causing a cracking reaction that breaks them down into smaller molecules, free radicals, or ultimately mineralizes them into CO? and H?O. This is known as direct photolysis. It is primarily used for TOC removal in ultrapure water, residual chlorine removal and disinfection prior to RO membranes for purified water, and the decomposition and disinfection of ammonium chloride in swimming pools and water features.

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